Tianjin International Symposium on Epitaxial Graphene
We invite you to join us at the 1st Tianjin International Symposium on Epitaxial Graphene (TISEG I) to be held on July 22-27, 2018 in Tianjin, China.
Epigraphene (epitaxial graphene) is graphene that grows on silicon carbide by thermal annealing. It provides the most promising platform to realize advanced graphene nanoelectronics. This meeting focuses on recent developments and new directions towards this ultimate goal.
The symposium will host about 50 speakers (plenary, invited and contributed) and up to 120 participants. Meetings will be held in the beautiful Tianjin University Faculty Club building; social events; poster sessions; exhibitions and collaboration planning meetings will be held in the brand new TICNN building.
The TISEG revives the tradition of the Georgia Tech, Science and Technology of Epitaxial Graphene meetings (STEG 1, STEG 2 ,and STEG 3) bringing together international leaders in the field to focus the effort and clarify the research goals.Since STEG 3 epigraphene has evolved considerably. Important advances have been made in epigraphene growth, patterning, and intercalation with a wide variety of materials. Great strides have also been made in understanding the electronic structure and new electronic transport properties have recently been discovered, that are nothing short of spectacular. It is fully expected that exciting and important discoveries will continue to bring us closer to realizing graphene nanoelectronics.
This meeting also celebrates the inauguration of the Tianjin International Center for Nanoparticles and Nanosystems (TICNN) on the Tianjin University campus. In partnership with Georgia Tech, TICNN is dedicated to fundamental studies and applications of epigraphene and nanoparticles. A primary goal of the center is to develop the epigraphene platform for high-speed and low-power nanoelectronics. In that context the center facilitates research programs involving international faculty and students in short- and long-term onsite collaborations.
We are looking forward to seeing you in Tianjin!
Walt de Heer, Claire Berger, Lei Ma.