The PanScan Freedom system is a scanning tunnel microscope (STM) that allows for the visualization of surface structures with atomic scale resoltuion. The PanScan Freedom is able to represent ultra low noise atomic structures in materials like crystalline metals, carbon nanotubes, and more.

The NX10 from Park Systems is an atomic force microscope (AFM) that boasts a wide range of scanning modes and the lowest noise measurements of almost any device in its class. The NX10 is also designed for the taking of non-contact measurements, meaning less tip wear and non-destructive tip-sample interactions.

The Hitachi SU3500 scanning electron microscope (SEM) offers unparalleled imaging opportunities. It is capable of 7 nm resolution at an accelerating voltage of 3 kV with auto-focusing. The new and user-friendly GUI allows for observation of 3D images of surfaces in real time. It has equiped with Raith EBL.

The TeslatronPT from Oxford Instruments is a cryogen free superconducting magnet system. It is able to produce magnetic fields of up to 14 T. When equipped with the appropriate accesories, temperatures as low as 300 mK are achievable with no need for cryogens, just electricity.

The MicroLab SVG-4A100 is a laser pattern generator/direct lighting system. This device is designed to fabricate precision patterns on planar substrates or curved surfaces. The SVGA-4A100 has four axis control parameters (x, y, z, θ) for maximum control when writing patterns on concave and/or convex surfaces.

The Nanonics MULTIVIEW 4000 is an atomic force microscopy system that can utilize up to four probes simultaneously that operate independently from one another. These probes working in tandem allow the system to measure sophisticated properties of the device in question all at once.

KDHPS-CC Helium Purifier developed by Pride Cryogenic is a key component of Helium recovery, purification and liquefaction system. It has many features, such as easy control, safe and reliable, low energy consumption, no liquid nytrogen consumption and so on. Because of these features, KDHPS-CC Helium Purifier has been widely used in the laboratories that needs helium purification and other occasions where helium of high purity is needed

The Model TTPX probe station from Lakeshore is capable of performing a plethora of non-destructive, standard electrical device measurements. It is capable of producing cryogenic temperatures via a continuous refrigeration system of either liquid helium or nitrogen.

The Shenyang electron beam evaporation chamber is widely used in the production of semiconductors, various kinds of films, and LEDs. The EB-500 possess the ability to evaporate and deposit aluminum, titanium, chromium, molybdenum, vanadium, nickel, silver, indium, other metals, ITOs, and other oxides onto a substrate.

Thermal Atomic Layer Deposition System(T-ALD) is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization .The electric of the system completely accords with the CE criterion. , it’s widely used in the fields of micro-electronic,nano material, optical film, solar battery etc.

Reactive ion etching machine(RIE-150) is a flat-plate dry etching machine widely used in etching Si and SiC. With four kinds of gases (including SF6，CF4，O2，Ar),RIE-150 can achieve fabrication of nano scale pattern with perfect sidewall profile automatically controlled by software.

Hitachi Spectrophotometer U-3900 covers a wide variety of analysis needs from liquid samples to solid samples. Line-up of two types that can be selected in accordance with the measuring object and application. For use in a wide range of fields that focus biotechnology, pharmaceuticals, materials.

The General/Twin-crystal high precision x-ray orientation instrument YX-2 adds a high precision testing device, and it realized that one instrument could orientate different diffraction density crystal chips, which improves the efficiency with lower cost, especially used in research lab, university.

The PlanarMet 300 bench top planar grinding machine with a high torque, continuous duty, 5.7Hp motor has an aggressive material removal rate normally seen in much larger, more expensive floor model machines. Convenience features such as an integrated auto wheel dressing and built in cooling make it easy to get consistent results.

GSL-1700X-3 (KSL-1200X OTF-1200X-60)is CE certified 80mm diameter alumina tube furnace with vacuum pump system (up to 10-5 torr) and 9 channel precision digital Mass flow-meters, which can control nine types of gases for CVD or diffusion and work up to 1700 degree centigrade.

Raman analysis provides structural information of materials. The confocal Raman microscope consists of an Andor Shamrock 500i imaging spectrometer integrated with a Leica DM2700 M microscope, a Raman excitation box, a laser controller and a handler for XY sample stage movement. This setup provides three laser beams of 532 nm, 638 nm and 785 nm（100mW）, and three diffraction gratings of 300 lines/mm, 600 lines/mm and 1800 lines/mm for different spectral requirements. In addition, the mapping is also available for the spectral characterizations in high spatial resolution.

The HB05 series bench top manual wire bonder is easy to use and ideal for laboratories, pilot production runs and small scale production lines. Configurable with a single bondhead for ball.

Magnetron sputtering is a physical coating instrument used in the field of physics, and various materials that can be prepared as target materials can be used as thin film materials. The magnetron sputtering equipment is equipped with a high vacuum system and adopts a three head design, which is in an equivalent position and can simultaneously perform multiple material doping sputtering.

TESCAN VEGA3 is a thermionic emission SEM system that comes with tungsten heated cathode as electron source. The system is able to be operated in both low and high vacuum modes. The VEGA3 system in our lab is fitted with variety of ports and configured with a large chamber size for further integrations.This VEGA3 is equipped with electron beam lithography (EBL) system, which has the best resolution compared to other lithographic techniques in nanotechnology applications on this level. We currently can routinely perform 50 nm single line lithography with e-beam resist polymethylmethacrylate (PMMA).