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Lecture|2025年“工程师走进课堂”系列讲座-第二讲-NanoFrazor Presentation at Tianjin

Wed, May 21 2025 01:30 PM 

2025/05/21 Wed. 9:00 am-11:00 am

Meeting Room, Fourth Floor, TICNN, Tianjin University

Title 1: Unlocking Novel Nanofabrication with NanoFrazor Patterning and Processing Technology-From Andrea Ubezio

Title 2: NanoFrazor Lithography for advanced 2D&3D nanodevices

From Dr ZhengMing Wu

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Unlocking Novel Nanofabrication with NanoFrazor Patterning and Processing Technology-From Andrea Ubezio

Abstract

How is nanolithography possible with the NanoFrazor? How is the lithography pattern later transferred to your substrate?

During the talk, I will explain the most important features of the NanoFrazor software and the most common pattern transfer techniques, trying to answer these two questions.

We will see critical software functionalities such as the Closed Loop Lithography (CLL), Mix & Match, Automated Overlay, Stitching and Smart Field Splitting, with short videos capturing the tool in live action, highlighting the importance of the features for your applications.

We will explore the most common NanoFrazor process flows with examples of applications, to understand how the lithography step can be integrated with metallization and etching with resolution below 20 nm, and grayscale structuring with resolution below 1 nm.

Speaker Biography

Andrea studied Materials Engineering (BSc, MSc) and Nanotechnology at Politecnico of Milano (Italy), then completed a MPhil research program in the Electronic and Computer Engineering Department at the Hong Kong University of Science and Technology (China). His research focus was semiconductor and perovskite nanowire arrays for novel optoelectronic devices. He is now a Research & Development Engineer at Heidelberg Instruments Nano. His main tasks involve technical customer support and training, research of high-resolution processing techniques and NanoFrazor tool development.

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Title 2: NanoFrazor Lithography for advanced 2D&3D nanodevices

From Dr ZhengMing Wu

Abstract

“Thermal scanning probe lithography (t-SPL) using the NanoFrazor from Heidelberg Instruments enables simultaneous patterning and inspection of nanoscale structures. Along with its integrated direct laser writer, this technology allows mix & match lithography of nanodevices. Combined with markerless second layer alignment and automation features, this versatile tool solves complex fabrication challenges and enables applications in various fields including nanophotonics, quantum nanoelectronics, nanobiosystems, and emerging materials research.

Short CV

ZhengMing Wu received her PhD in University of Basel, she fabricated nano-devices using UV and e-beam lithography in the group of Prof Schoenberger. In 2009, she joined Nanosurf and successfully set up and developed the sales network in Asia. In 2014, she joined Heidelberg Instruments Nano as the first salesperson and established a worldwide sales network. ZhengMing can be found at international conferences, seminars, and workshops where she explains the NanoFrazor technology and discusses applications.



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